On electron beam lithography for LSI circuit fabrication /

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Bibliographic Details
OCLC:7157665
Main Author: Åstrand, Börje
Corporate Author: Kungl. Tekniska högskolan
Language:English
Published: Stockholm : Royal Institute of Technology, Dept. of Applied Electronics, 1979.
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Format:

Thesis Monograph

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Description
Physical Description:14 leaves ; 30 cm.
Bibliography:Bibliography: leaves 13-14.
Place of Publication:Sweden.