On electron beam lithography for LSI circuit fabrication /
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OCLC: | 7157665 |
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Main Author: | |
Corporate Author: | |
Language: | English |
Published: |
Stockholm :
Royal Institute of Technology, Dept. of Applied Electronics,
1979.
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Format: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |
Physical Description: | 14 leaves ; 30 cm. |
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Bibliography: | Bibliography: leaves 13-14. |
Place of Publication: | Sweden. |