Plasma assisted processes for microelectronic applications /
Bewaard in:
| OCLC: | 19470321 |
|---|---|
| Hoofdauteur: | |
| Coauteur: | |
| Taal: | English |
| Gepubliceerd in: |
Uppsala :
Uppsala Universitet,
1988.
|
| Reeks: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science,
137. |
| Onderwerpen: | |
| Formaat: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |