Plasma assisted processes for microelectronic applications /
Guardat en:
| OCLC: | 19470321 |
|---|---|
| Autor principal: | |
| Autor corporatiu: | |
| Idioma: | English |
| Publicat: |
Uppsala :
Uppsala Universitet,
1988.
|
| Col·lecció: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science,
137. |
| Matèries: | |
| Format: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |