Plasma assisted processes for microelectronic applications /
保存先:
| OCLC: | 19470321 |
|---|---|
| 第一著者: | |
| 団体著者: | |
| 言語: | English |
| 出版事項: |
Uppsala :
Uppsala Universitet,
1988.
|
| シリーズ: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science,
137. |
| 主題: | |
| フォーマット: | 学位論文 Monograph Note that CRL will digitize material from the collection when copyright allows. |
| 物理的記述: | 21 p. : ill. ; 21 cm. |
|---|---|
| 書誌: | Includes bibliographical references (p. 21) |
| ISBN: | 9155421997 9789155421991 |
| ISSN: | 0282-7468 ; |
| 出版地: | Sweden. |