Studies of thin film plasma processes for microelectronic device manufacturing /

Gorde:
Xehetasun bibliografikoak
OCLC:28002939
Egile nagusia: Barklund, Anna M.
Erakunde egilea: Uppsala universitet
Hizkuntza:English
Argitaratua: Uppsala : Stockholm, Sweden : Uppsala University ; Distributor, Almqvist & Wiksell International, 1992.
Saila:Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science, 406.
Gaiak:
Plasma etching.
Vapor-plating.
Thin films.
Microelectronics.
Semiconductors > Etching.
Semiconductor doping.
Formatua:

Thesis Monograph

Note that CRL will digitize material from the collection when copyright allows.

Deskribapena
Deskribapen fisikoa:43 p. : ill. ; 25 cm.
Bibliografia:Includes bibliographical references (p. 42-43)
ISBN:9155429947
ISSN:0282-7468 ;
Argitaratze lekua:Sweden.

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