CVD growth of silicon carbide for high frequency applications /
Guardado en:
| OCLC: | 48245343 |
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| Autor principal: | |
| Autor Corporativo: | |
| Lenguaje: | English |
| Publicado: |
Linköping :
Dept. of Physics and Measurement Technology, Linköpings universitet,
2001.
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| Colección: | Linköping studies in science and technology. Dissertations ;
no. 708. |
| Materias: | |
| Formato: | Tesis Monograph Note that CRL will digitize material from the collection when copyright allows. |