Åstrand, B. (1979). On electron beam lithography for LSI circuit fabrication. Royal Institute of Technology, Dept. of Applied Electronics.
Chicago Style (17th ed.) CitationÅstrand, Börje. On Electron Beam Lithography for LSI Circuit Fabrication. Stockholm: Royal Institute of Technology, Dept. of Applied Electronics, 1979.
MLA引文Åstrand, Börje. On Electron Beam Lithography for LSI Circuit Fabrication. Royal Institute of Technology, Dept. of Applied Electronics, 1979.
警告:这些引文格式不一定是100%准确.