Hochauflosende Rontgenlithografie zur Herstellung polymerer Submikrometerstrukturen mit groem Aspektverhaltnis /
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| OCLC: | 68263568 |
|---|---|
| Main Author: | |
| Corporate Authors: | , , |
| Other Authors: | , |
| Language: | German |
| Published: |
Karlsruhe, [Germany] :
Forschungszentrum Karlsruhe,
2006.
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| Series: | Wissenschaftliche Berichte (Forschungszentrum Karlsruhe) ;
FZKA 7215. |
| Format: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |