Transport phenomena in chemical vapor deposition reactors /

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Bibliographic Details
OCLC:25576451
Main Author: Kleijn, Chris R., 1960-
Corporate Author: Technische Universiteit Delft
Language:English
Published: [S.l. : s.n.], 1991.
Subjects:
Vapor-plating > Mathematical models.
Thin films > Mathematical models.
Chemical reactors.
MASS TRANSFER.
MATHEMATICAL MODELS.
TRANSPORT THEORY.
VAPOR DEPOSITION.
Chemical vapour deposition.
Reactoren.
Stoftransport.
Format:

Thesis Monograph

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