Strukturprofilsimulation dicker Schichten in der optischen Lithographie mit DNQ-Novolak-basierenden Photoresists /
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OCLC: | 45561554 |
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Main Author: | |
Corporate Author: | |
Other Authors: | , |
Language: | German |
Published: |
Karlsruhe [Germany] :
Forschungszentrum Karlsruhe,
1998.
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Series: | Wissenschaftliche Berichte (Forschungszentrum Karlsruhe. Technik und Umwelt) ;
FZKA 6111. |
Format: | Government Document Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |