Modeling, simulation and experimental studies of plasma processing /
Enregistré dans:
| OCLC: | 41136677 |
|---|---|
| Auteur principal: | |
| Collectivité auteur: | |
| Langue: | English |
| Publié: |
Uppsala :
Acta Universitatis Upsaliensis,
1997.
|
| Collection: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the faculty of science and technology,
258. |
| Sujets: | |
| Format: | Thèse Monograph Note that CRL will digitize material from the collection when copyright allows. |
| LEADER | 01504nam a2200373Ia 4500 | ||
|---|---|---|---|
| 001 | in00005599286 | ||
| 003 | OCoLC | ||
| 005 | 20060622013508.0 | ||
| 008 | 990409s1997 sw a b 000 0 eng d | ||
| 020 | |a 9155439225 | ||
| 029 | 1 | |a NLGGC |b 157321886 | |
| 035 | |a (OCoLC)41136677 | ||
| 040 | |a NDD |c NDD |d CRL | ||
| 049 | |a CRLL | ||
| 092 | |a 505 |b A188, U58x, no. 258 | ||
| 099 | |a P-00386264 | ||
| 100 | 1 | |a Hedlund, Christer. | |
| 245 | 1 | 0 | |a Modeling, simulation and experimental studies of plasma processing / |c by Christer Hedlund. |
| 260 | |a Uppsala : |b Acta Universitatis Upsaliensis, |c 1997. | ||
| 300 | |a 48 p. : |b ill. ; |c 25 cm. | ||
| 336 | |a text |b txt |2 rdacontent. | ||
| 337 | |a unmediated |b n |2 rdamedia. | ||
| 338 | |a volume |b nc |2 rdacarrier. | ||
| 490 | 0 | |a Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the faculty of science and technology, |x 1104-232X ; |v 258. | |
| 502 | |b doctoral |c Uppsala University |d 1997. | ||
| 504 | |a Includes bibliographical references (p. 48) | ||
| 650 | 0 | |a Plasma etching. | |
| 650 | 0 | |a Semiconductors |x Etching. | |
| 710 | 2 | |a Uppsala universitet. | |
| 752 | |a Sweden. | ||
| 907 | |a .b15374804 |b 03-04-22 |c 04-27-01 | ||
| 998 | |a diss |b 06-22-06 |c m |d - |e - |f eng |g sw |h 0 |i 1 | ||
| 999 | f | f | |i fd269934-c74d-53f6-a98d-711f2647672b |s 202c031b-f8ff-5fb7-a7b0-a0590003ca8b |t 0 |