Hochauflosende Rontgenlithografie zur Herstellung polymerer Submikrometerstrukturen mit groem Aspektverhaltnis /
Saved in:
| OCLC: | 68263568 |
|---|---|
| 主要作者: | |
| Corporate Authors: | , , |
| 其他作者: | , |
| 語言: | German |
| 出版: |
Karlsruhe, [Germany] :
Forschungszentrum Karlsruhe,
2006.
|
| 叢編: | Wissenschaftliche Berichte (Forschungszentrum Karlsruhe) ;
FZKA 7215. |
| 格式: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |
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