Plasma assisted processes for microelectronic applications /
Saved in:
| OCLC: | 19470321 |
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| 主要作者: | |
| 企业作者: | |
| 语言: | English |
| 出版: |
Uppsala :
Uppsala Universitet,
1988.
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| 丛编: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science,
137. |
| 主题: | |
| 格式: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |