Plasma assisted processes for microelectronic applications /
Сохранить в:
| OCLC: | 19470321 |
|---|---|
| Главный автор: | |
| Соавтор: | |
| Язык: | English |
| Опубликовано: |
Uppsala :
Uppsala Universitet,
1988.
|
| Серии: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science,
137. |
| Предметы: | |
| Формат: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |