Plasma assisted processes for microelectronic applications /
Salvato in:
| OCLC: | 19470321 |
|---|---|
| Autore principale: | |
| Ente Autore: | |
| Lingua: | English |
| Pubblicazione: |
Uppsala :
Uppsala Universitet,
1988.
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| Serie: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science,
137. |
| Soggetti: | |
| Natura: | Tesi Monograph Note that CRL will digitize material from the collection when copyright allows. |