Plasma assisted processes for microelectronic applications /

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Bibliografski detalji
OCLC:19470321
Glavni autor: Nender, Claes
Autor kompanije: Uppsala universitet
Jezik:English
Izdano: Uppsala : Uppsala Universitet, 1988.
Serija:Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science, 137.
Teme:
Format:

Disertacija Monograph

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