Plasma assisted processes for microelectronic applications /
Gardado en:
| OCLC: | 19470321 |
|---|---|
| Autor Principal: | |
| Autor Corporativo: | |
| Idioma: | English |
| Publicado: |
Uppsala :
Uppsala Universitet,
1988.
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| Series: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science,
137. |
| Subjects: | |
| Formato: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |