Plasma assisted processes for microelectronic applications /
Enregistré dans:
| OCLC: | 19470321 |
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| Auteur principal: | |
| Collectivité auteur: | |
| Langue: | English |
| Publié: |
Uppsala :
Uppsala Universitet,
1988.
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| Collection: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science,
137. |
| Sujets: | |
| Format: | Thèse Monograph Note that CRL will digitize material from the collection when copyright allows. |