Plasma assisted processes for microelectronic applications /

Gorde:
Xehetasun bibliografikoak
OCLC:19470321
Egile nagusia: Nender, Claes
Erakunde egilea: Uppsala universitet
Hizkuntza:English
Argitaratua: Uppsala : Uppsala Universitet, 1988.
Saila:Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science, 137.
Gaiak:
Formatua:

Thesis Monograph

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