Plasma assisted processes for microelectronic applications /
Saved in:
| OCLC: | 19470321 |
|---|---|
| Main Author: | |
| Corporate Author: | |
| Language: | English |
| Published: |
Uppsala :
Uppsala Universitet,
1988.
|
| Series: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science,
137. |
| Subjects: | |
| Format: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |
| LEADER | 01528cam a2200397Ia 45 0 | ||
|---|---|---|---|
| 001 | in00006398432 | ||
| 003 | OCoLC | ||
| 005 | 00010101120000.0 | ||
| 008 | 890329s1988 sw a bm 000 0 eng d | ||
| 020 | |a 9155421997 | ||
| 020 | |a 9789155421991 | ||
| 029 | 1 | |a NLGGC |b 195493885 | |
| 035 | |a (OCoLC)19470321 | ||
| 040 | |a NDD |c NDD |d OCLCQ |d CRL | ||
| 049 | |a CRLL | ||
| 092 | |a 013.378485 |b A188, U58x, no. 137 | ||
| 099 | |a P-00556693 | ||
| 100 | 1 | |a Nender, Claes. | |
| 245 | 1 | 0 | |a Plasma assisted processes for microelectronic applications / |c Claes Nender. |
| 260 | |a Uppsala : |b Uppsala Universitet, |c 1988. | ||
| 300 | |a 21 p. : |b ill. ; |c 21 cm. | ||
| 336 | |a text |b txt |2 rdacontent. | ||
| 337 | |a unmediated |b n |2 rdamedia. | ||
| 338 | |a volume |b nc |2 rdacarrier. | ||
| 490 | 0 | |a Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science, |x 0282-7468 ; |v 137. | |
| 502 | |b doctoral |c Uppsala University |d 1988. | ||
| 504 | |a Includes bibliographical references (p. 21) | ||
| 650 | 0 | |a Plasma etching. | |
| 650 | 0 | |a Plasma engineering. | |
| 650 | 0 | |a Microelectronics. | |
| 710 | 2 | |a Uppsala universitet. | |
| 752 | |a Sweden. | ||
| 907 | |a .b23585717 |b 03-04-22 |c 01-29-08 | ||
| 998 | |a diss |b 01-29-08 |c m |d - |e - |f eng |g sw |h 0 |i 1 | ||
| 999 | f | f | |i a8ab76fc-39a8-5ccf-bf48-3d1e08d78e1a |s ba50c7d8-8c1f-5e5b-9e21-35e1c4a02128 |t 0 |