Plasma assisted processes for microelectronic applications /

Shranjeno v:
Bibliografske podrobnosti
OCLC:19470321
Glavni avtor: Nender, Claes
Korporativna značnica: Uppsala universitet
Jezik:English
Izdano: Uppsala : Uppsala Universitet, 1988.
Serija:Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science, 137.
Teme:
Format:

Thesis Monograph

Note that CRL will digitize material from the collection when copyright allows.

Opis
Fizični opis:21 p. : ill. ; 21 cm.
Bibliografija:Includes bibliographical references (p. 21)
ISBN:9155421997
9789155421991
ISSN:0282-7468 ;
Place of Publication:Sweden.