Plasma assisted processes for microelectronic applications /
Guardado en:
| OCLC: | 19470321 |
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| Autor principal: | |
| Autor Corporativo: | |
| Lenguaje: | English |
| Publicado: |
Uppsala :
Uppsala Universitet,
1988.
|
| Colección: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science,
137. |
| Materias: | |
| Formato: | Tesis Monograph Note that CRL will digitize material from the collection when copyright allows. |
| Descripción Física: | 21 p. : ill. ; 21 cm. |
|---|---|
| Bibliografía: | Includes bibliographical references (p. 21) |
| ISBN: | 9155421997 9789155421991 |
| ISSN: | 0282-7468 ; |
| Lugar de publicación: | Sweden. |