Plasma assisted processes for microelectronic applications /

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Bibliographic Details
OCLC:19470321
Main Author: Nender, Claes
Corporate Author: Uppsala universitet
Language:English
Published: Uppsala : Uppsala Universitet, 1988.
Series:Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science, 137.
Subjects:
Plasma etching.
Plasma engineering.
Microelectronics.
Format:

Thesis Monograph

Note that CRL will digitize material from the collection when copyright allows.

Description
Physical Description:21 p. : ill. ; 21 cm.
Bibliography:Includes bibliographical references (p. 21)
ISBN:9155421997
9789155421991
ISSN:0282-7468 ;
Place of Publication:Sweden.

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