Nender, C. (1988). Plasma assisted processes for microelectronic applications. Uppsala Universitet.
Chicago Style (17th ed.) CitationNender, Claes. Plasma Assisted Processes for Microelectronic Applications. Uppsala: Uppsala Universitet, 1988.
MLA引文Nender, Claes. Plasma Assisted Processes for Microelectronic Applications. Uppsala Universitet, 1988.
警告:這些引文格式不一定是100%准確.