Nender, C. (1988). Plasma assisted processes for microelectronic applications. Uppsala Universitet.
Cita Chicago Style (17a ed.)Nender, Claes. Plasma Assisted Processes for Microelectronic Applications. Uppsala: Uppsala Universitet, 1988.
Cita MLA (8a ed.)Nender, Claes. Plasma Assisted Processes for Microelectronic Applications. Uppsala Universitet, 1988.
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