The electrical activity of defects created in silicon single crystals during ion implantation /
Sábháilte in:
| OCLC: | 3928247 |
|---|---|
| Príomhchruthaitheoir: | |
| Údar corparáideach: | |
| Teanga: | English |
| Foilsithe / Cruthaithe: |
Göteborg,
1973.
|
| Sraith: | Doktorsavhandlingar vid Chalmers tekniska högskola.
|
| Ábhair: | |
| Formáid: | Tráchtas Monograph Note that CRL will digitize material from the collection when copyright allows. |
| Cur síos ar an mír: | Photocopy. 1974. -- 30 cm. |
|---|---|
| Cur síos fisiciúil: | [78] leaves : ill. |
| Leabharliosta: | Includes bibliographical references. |
| Áit a fhoilsithe: | Sweden. |