Vacuum deposition by pulsed laser radiation : plasma composition, deposition techniques and thin film properties
Guardat en:
| OCLC: | 26709106 |
|---|---|
| Autor principal: | |
| Autor corporatiu: | |
| Idioma: | English |
| Publicat: |
[S.l. :
s.n.,
1991?]
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| Matèries: | |
| Format: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |