Vacuum deposition by pulsed laser radiation : plasma composition, deposition techniques and thin film properties
Saved in:
| OCLC: | 26709106 |
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| 主要作者: | |
| 企业作者: | |
| 语言: | English |
| 出版: |
[S.l. :
s.n.,
1991?]
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| 主题: | |
| 格式: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |