Vacuum deposition by pulsed laser radiation : plasma composition, deposition techniques and thin film properties

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書目詳細資料
OCLC:26709106
主要作者: Shi, Liang
企業作者: Technische Universiteit Delft
語言:English
出版: [S.l. : s.n., 1991?]
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Thesis Monograph

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實物特徵 Local Call Number 狀態
P-00128127 可用