Vacuum deposition by pulsed laser radiation : plasma composition, deposition techniques and thin film properties
Na minha lista:
| OCLC: | 26709106 |
|---|---|
| Autor principal: | |
| Autor Corporativo: | |
| Idioma: | English |
| Publicado em: |
[S.l. :
s.n.,
1991?]
|
| Assuntos: | |
| Formato: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |