Vacuum deposition by pulsed laser radiation : plasma composition, deposition techniques and thin film properties

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Bibliografski detalji
OCLC:26709106
Glavni autor: Shi, Liang
Autor kompanije: Technische Universiteit Delft
Jezik:English
Izdano: [S.l. : s.n., 1991?]
Teme:
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Disertacija Monograph

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