Vacuum deposition by pulsed laser radiation : plasma composition, deposition techniques and thin film properties

में बचाया:
ग्रंथसूची विवरण
OCLC:26709106
मुख्य लेखक: Shi, Liang
निगमित लेखक: Technische Universiteit Delft
भाषा:English
प्रकाशित: [S.l. : s.n., 1991?]
विषय:
स्वरूप:

थीसिस Monograph

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