Vacuum deposition by pulsed laser radiation : plasma composition, deposition techniques and thin film properties

Sábháilte in:
Sonraí bibleagrafaíochta
OCLC:26709106
Príomhchruthaitheoir: Shi, Liang
Údar corparáideach: Technische Universiteit Delft
Teanga:English
Foilsithe / Cruthaithe: [S.l. : s.n., 1991?]
Ábhair:
Formáid:

Tráchtas Monograph

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P-00128127 Ar fáil