Vacuum deposition by pulsed laser radiation : plasma composition, deposition techniques and thin film properties

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Bibliografiske detaljer
OCLC:26709106
Hovedforfatter: Shi, Liang
Institution som forfatter: Technische Universiteit Delft
Sprog:English
Udgivet: [S.l. : s.n., 1991?]
Fag:
Format:

Thesis Monograph

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