Vacuum deposition by pulsed laser radiation : plasma composition, deposition techniques and thin film properties

Kaydedildi:
Detaylı Bibliyografya
OCLC:26709106
Yazar: Shi, Liang
Müşterek Yazar: Technische Universiteit Delft
Dil:English
Baskı/Yayın Bilgisi: [S.l. : s.n., 1991?]
Konular:
Materyal Türü:

Tez Monograph

Note that CRL will digitize material from the collection when copyright allows.

LEADER 01486nam a2200385Ia 4500
001 in00005769975
003 OCoLC
005 20030515114600.0
008 921001s1989 ne a b 000 0 eng d
035 |a (OCoLC)26709106  
040 |a AFM  |c AFM  |d CRL 
041 0 |a eng  |b dut 
049 |a CRLL 
090 |a QC718.5.L3  |b .S55 1989 
099 |a P-00128127 
100 1 |a Shi, Liang. 
245 1 0 |a Vacuum deposition by pulsed laser radiation :  |b plasma composition, deposition techniques and thin film properties /  |c door Liang Shi. 
260 |a [S.l. :  |b s.n.,  |c 1991?] 
300 |a [v], 110 p. :  |b ill. ;  |c 24 cm. +  |e stellingen (2 p.) 
336 |a text  |b txt  |2 rdacontent. 
337 |a unmediated  |b n  |2 rdamedia. 
338 |a volume  |b nc  |2 rdacarrier. 
500 |a In English with summary in Dutch. 
502 |b doctoral  |c Technische Universiteit Delft  |d 1989. 
504 |a Includes bibliographical references. 
650 0 |a Lasers in plasma research. 
650 0 |a Laser plasmas. 
650 0 |a Thin films. 
650 0 |a Laser-plasma interactions. 
710 2 |a Technische Universiteit Delft. 
752 |a Netherlands. 
907 |a .b1717515x  |b 03-15-22  |c 05-15-03 
998 |a diss  |b 05-15-03  |c m  |d -  |e -  |f eng  |g ne   |h 0  |i 1 
999 f f |i 6d2ce2c5-97b1-5d2c-88fe-6445c417a5bd  |s 9504b29c-c9aa-580f-b4c8-cec6046dc4b6  |t 0