Vacuum deposition by pulsed laser radiation : plasma composition, deposition techniques and thin film properties
Kaydedildi:
OCLC: | 26709106 |
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Yazar: | |
Müşterek Yazar: | |
Dil: | English |
Baskı/Yayın Bilgisi: |
[S.l. :
s.n.,
1991?]
|
Konular: | |
Materyal Türü: | Tez Monograph Note that CRL will digitize material from the collection when copyright allows. |
LEADER | 01486nam a2200385Ia 4500 | ||
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001 | in00005769975 | ||
003 | OCoLC | ||
005 | 20030515114600.0 | ||
008 | 921001s1989 ne a b 000 0 eng d | ||
035 | |a (OCoLC)26709106 | ||
040 | |a AFM |c AFM |d CRL | ||
041 | 0 | |a eng |b dut | |
049 | |a CRLL | ||
090 | |a QC718.5.L3 |b .S55 1989 | ||
099 | |a P-00128127 | ||
100 | 1 | |a Shi, Liang. | |
245 | 1 | 0 | |a Vacuum deposition by pulsed laser radiation : |b plasma composition, deposition techniques and thin film properties / |c door Liang Shi. |
260 | |a [S.l. : |b s.n., |c 1991?] | ||
300 | |a [v], 110 p. : |b ill. ; |c 24 cm. + |e stellingen (2 p.) | ||
336 | |a text |b txt |2 rdacontent. | ||
337 | |a unmediated |b n |2 rdamedia. | ||
338 | |a volume |b nc |2 rdacarrier. | ||
500 | |a In English with summary in Dutch. | ||
502 | |b doctoral |c Technische Universiteit Delft |d 1989. | ||
504 | |a Includes bibliographical references. | ||
650 | 0 | |a Lasers in plasma research. | |
650 | 0 | |a Laser plasmas. | |
650 | 0 | |a Thin films. | |
650 | 0 | |a Laser-plasma interactions. | |
710 | 2 | |a Technische Universiteit Delft. | |
752 | |a Netherlands. | ||
907 | |a .b1717515x |b 03-15-22 |c 05-15-03 | ||
998 | |a diss |b 05-15-03 |c m |d - |e - |f eng |g ne |h 0 |i 1 | ||
999 | f | f | |i 6d2ce2c5-97b1-5d2c-88fe-6445c417a5bd |s 9504b29c-c9aa-580f-b4c8-cec6046dc4b6 |t 0 |