Diffusion barriers in semiconductor contact metallization /
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| OCLC: | 35460166 |
|---|---|
| Main Author: | |
| Corporate Authors: | , |
| Language: | English |
| Published: |
Espoo :
Technical Research Centre of Finland,
1988.
|
| Series: | Publications (Valtion teknillinen tutkimuskeskus) ;
48. |
| Format: | Government Document Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |