Growth Kinetics of Silicon Films Deposited by Molecular Beam Epitaxy /
Gardado en:
| OCLC: | 62206886 |
|---|---|
| Autor Principal: | |
| Autor Corporativo: | |
| Idioma: | English |
| Publicado: |
1985.
|
| Formato: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |