Studies of thin film plasma processes for microelectronic device manufacturing /

Saved in:
Bibliographic Details
OCLC:28002939
Main Author: Barklund, Anna M.
Corporate Author: Uppsala universitet
Language:English
Published: Uppsala : Stockholm, Sweden : Uppsala University ; Distributor, Almqvist & Wiksell International, 1992.
Series:Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science, 406.
Subjects:
Plasma etching.
Vapor-plating.
Thin films.
Microelectronics.
Semiconductors > Etching.
Semiconductor doping.
Format:

Thesis Monograph

Note that CRL will digitize material from the collection when copyright allows.

Description
Physical Description:43 p. : ill. ; 25 cm.
Bibliography:Includes bibliographical references (p. 42-43)
ISBN:9155429947
ISSN:0282-7468 ;
Place of Publication:Sweden.

Similar Items