CVD growth of silicon carbide for high frequency applications /
Enregistré dans:
OCLC: | 48245343 |
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Auteur principal: | |
Collectivité auteur: | |
Langue: | English |
Publié: |
Linköping :
Dept. of Physics and Measurement Technology, Linköpings universitet,
2001.
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Collection: | Linköping studies in science and technology. Dissertations ;
no. 708. |
Sujets: | |
Format: | Thèse Monograph Note that CRL will digitize material from the collection when copyright allows. |