CVD growth of silicon carbide for high frequency applications /
Guardat en:
| OCLC: | 48245343 |
|---|---|
| Autor principal: | |
| Autor corporatiu: | |
| Idioma: | English |
| Publicat: |
Linköping :
Dept. of Physics and Measurement Technology, Linköpings universitet,
2001.
|
| Col·lecció: | Linköping studies in science and technology. Dissertations ;
no. 708. |
| Matèries: | |
| Format: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |