High-rate reactive magnetron sputter deposition and characterization of metal oxide films /
Сохранить в:
| OCLC: | 47068374 |
|---|---|
| Главный автор: | |
| Соавтор: | |
| Язык: | English |
| Опубликовано: |
Uppsala :
Acta Universitatis Upsaliensis,
2000.
|
| Серии: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology ;
520. |
| Предметы: | |
| Формат: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |