High-rate reactive magnetron sputter deposition and characterization of metal oxide films /
Na minha lista:
| OCLC: | 47068374 |
|---|---|
| Autor principal: | |
| Autor Corporativo: | |
| Idioma: | English |
| Publicado em: |
Uppsala :
Acta Universitatis Upsaliensis,
2000.
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| coleção: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology ;
520. |
| Assuntos: | |
| Formato: | Tese Monograph Note that CRL will digitize material from the collection when copyright allows. |