High-rate reactive magnetron sputter deposition and characterization of metal oxide films /
Na minha lista:
OCLC: | 47068374 |
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Autor principal: | |
Autor Corporativo: | |
Idioma: | English |
Publicado em: |
Uppsala :
Acta Universitatis Upsaliensis,
2000.
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Colecção: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology ;
520. |
Assuntos: | |
Formato: | Thesis Monograph Note that CRL will digitize material from the collection when copyright allows. |