High-rate reactive magnetron sputter deposition and characterization of metal oxide films /
保存先:
| OCLC: | 47068374 |
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| 第一著者: | |
| 団体著者: | |
| 言語: | English |
| 出版事項: |
Uppsala :
Acta Universitatis Upsaliensis,
2000.
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| シリーズ: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology ;
520. |
| 主題: | |
| フォーマット: | 学位論文 Monograph Note that CRL will digitize material from the collection when copyright allows. |