High-rate reactive magnetron sputter deposition and characterization of metal oxide films /
में बचाया:
| OCLC: | 47068374 |
|---|---|
| मुख्य लेखक: | |
| निगमित लेखक: | |
| भाषा: | English |
| प्रकाशित: |
Uppsala :
Acta Universitatis Upsaliensis,
2000.
|
| श्रृंखला: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology ;
520. |
| विषय: | |
| स्वरूप: | थीसिस Monograph Note that CRL will digitize material from the collection when copyright allows. |