High-rate reactive magnetron sputter deposition and characterization of metal oxide films /
Sábháilte in:
| OCLC: | 47068374 |
|---|---|
| Príomhchruthaitheoir: | |
| Údar corparáideach: | |
| Teanga: | English |
| Foilsithe / Cruthaithe: |
Uppsala :
Acta Universitatis Upsaliensis,
2000.
|
| Sraith: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology ;
520. |
| Ábhair: | |
| Formáid: | Tráchtas Monograph Note that CRL will digitize material from the collection when copyright allows. |