High-rate reactive magnetron sputter deposition and characterization of metal oxide films /
Enregistré dans:
| OCLC: | 47068374 |
|---|---|
| Auteur principal: | |
| Collectivité auteur: | |
| Langue: | English |
| Publié: |
Uppsala :
Acta Universitatis Upsaliensis,
2000.
|
| Collection: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology ;
520. |
| Sujets: | |
| Format: | Thèse Monograph Note that CRL will digitize material from the collection when copyright allows. |