High-rate reactive magnetron sputter deposition and characterization of metal oxide films /
Gespeichert in:
| OCLC: | 47068374 |
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| 1. Verfasser: | |
| Körperschaft: | |
| Sprache: | English |
| Veröffentlicht: |
Uppsala :
Acta Universitatis Upsaliensis,
2000.
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| Schriftenreihe: | Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology ;
520. |
| Schlagworte: | |
| Format: | Abschlussarbeit Monograph Note that CRL will digitize material from the collection when copyright allows. |