High-rate reactive magnetron sputter deposition and characterization of metal oxide films /

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OCLC:47068374
Hlavní autor: Olsson, Maryam Kharrazi
Korporativní autor: Uppsala universitet
Jazyk:English
Vydáno: Uppsala : Acta Universitatis Upsaliensis, 2000.
Edice:Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology ; 520.
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Diplomová práce Monograph

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