High-rate reactive magnetron sputter deposition and characterization of metal oxide films /

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Bibliographic Details
OCLC:47068374
Main Author: Olsson, Maryam Kharrazi
Corporate Author: Uppsala universitet
Language:English
Published: Uppsala : Acta Universitatis Upsaliensis, 2000.
Series:Acta Universitatis Upsaliensis. Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology ; 520.
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Format:

Thesis Monograph

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100 1 |a Olsson, Maryam Kharrazi. 
245 1 0 |a High-rate reactive magnetron sputter deposition and characterization of metal oxide films /  |c by Maryam Kharrazi Olsson. 
260 |a Uppsala :  |b Acta Universitatis Upsaliensis,  |c 2000. 
300 |a 78 p. :  |b ill. ;  |c 25 cm. 
336 |a text  |b txt  |2 rdacontent. 
337 |a unmediated  |b n  |2 rdamedia. 
338 |a volume  |b nc  |2 rdacarrier. 
490 1 |a Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology ;  |v 520. 
502 |b doctoral  |c Uppsala University. 
504 |a Includes bibliographical references (p. 72-78) 
650 0 |a Thin films. 
650 0 |a Sputtering (Physics) 
650 0 |a Metallic oxides  |x Surfaces. 
650 0 |a Magnetrons. 
710 2 |a Uppsala universitet. 
752 |a Sweden. 
830 0 |a Acta Universitatis Upsaliensis.  |p Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology ;  |v 520. 
907 |a .b22111359  |b 03-04-22  |c 03-05-07 
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